Atomic-scale intercalation and defect engineering for enhanced magnetism and optoelectronic properties in atomically thin GeS

Abstract We investigate the synergistic effects of chromocene intercalation (GeS–Cr $$(\mathrm {C_5H_5})_2$$ ) and randomly distributed sulfur vacancies on the optoelectronic properties of atomically thin GeS using advanced first-principles many-body simulations. We demonstrate the emergence of a ma...

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Main Authors: Anthony C. Iloanya, Srihari M. Kastuar, Gour Jana, Chinedu E. Ekuma
Format: Article
Language:English
Published: Nature Portfolio 2025-02-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-025-88290-z
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author Anthony C. Iloanya
Srihari M. Kastuar
Gour Jana
Chinedu E. Ekuma
author_facet Anthony C. Iloanya
Srihari M. Kastuar
Gour Jana
Chinedu E. Ekuma
author_sort Anthony C. Iloanya
collection DOAJ
description Abstract We investigate the synergistic effects of chromocene intercalation (GeS–Cr $$(\mathrm {C_5H_5})_2$$ ) and randomly distributed sulfur vacancies on the optoelectronic properties of atomically thin GeS using advanced first-principles many-body simulations. We demonstrate the emergence of a magnetic ground state in GeS, driven by weak chemical interactions between the GeS host and the intercalated organometallic chromocene. Using large-scale, first-principles many-body simulations that account for randomly distributed sulfur vacancies and the dielectric screening within the hybrid material, we show the tunability of the optoelectronic features. Specifically, we observe enhanced absorption in the range of $$\sim$$  0.21 to 3.5 eV, including absorption below the bandgap threshold as the vacancy concentration is tuned between 1 and 5%. The emergent Lifshitz tails are in excellent agreement with our numerical calculations. The predicted features and tunability underscore the potential of defect engineering for applications in magneto-optics and high-density data storage, where precise manipulation of light with magnetic fields is crucial for advanced applications.
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spelling doaj-art-83d6b68ddadf4ec69d570153bc7509cb2025-02-09T12:35:13ZengNature PortfolioScientific Reports2045-23222025-02-011511710.1038/s41598-025-88290-zAtomic-scale intercalation and defect engineering for enhanced magnetism and optoelectronic properties in atomically thin GeSAnthony C. Iloanya0Srihari M. Kastuar1Gour Jana2Chinedu E. Ekuma3Department of Physics, Lehigh UniversityDepartment of Physics, Lehigh UniversityDepartment of Physics, Lehigh UniversityDepartment of Physics, Lehigh UniversityAbstract We investigate the synergistic effects of chromocene intercalation (GeS–Cr $$(\mathrm {C_5H_5})_2$$ ) and randomly distributed sulfur vacancies on the optoelectronic properties of atomically thin GeS using advanced first-principles many-body simulations. We demonstrate the emergence of a magnetic ground state in GeS, driven by weak chemical interactions between the GeS host and the intercalated organometallic chromocene. Using large-scale, first-principles many-body simulations that account for randomly distributed sulfur vacancies and the dielectric screening within the hybrid material, we show the tunability of the optoelectronic features. Specifically, we observe enhanced absorption in the range of $$\sim$$  0.21 to 3.5 eV, including absorption below the bandgap threshold as the vacancy concentration is tuned between 1 and 5%. The emergent Lifshitz tails are in excellent agreement with our numerical calculations. The predicted features and tunability underscore the potential of defect engineering for applications in magneto-optics and high-density data storage, where precise manipulation of light with magnetic fields is crucial for advanced applications.https://doi.org/10.1038/s41598-025-88290-z
spellingShingle Anthony C. Iloanya
Srihari M. Kastuar
Gour Jana
Chinedu E. Ekuma
Atomic-scale intercalation and defect engineering for enhanced magnetism and optoelectronic properties in atomically thin GeS
Scientific Reports
title Atomic-scale intercalation and defect engineering for enhanced magnetism and optoelectronic properties in atomically thin GeS
title_full Atomic-scale intercalation and defect engineering for enhanced magnetism and optoelectronic properties in atomically thin GeS
title_fullStr Atomic-scale intercalation and defect engineering for enhanced magnetism and optoelectronic properties in atomically thin GeS
title_full_unstemmed Atomic-scale intercalation and defect engineering for enhanced magnetism and optoelectronic properties in atomically thin GeS
title_short Atomic-scale intercalation and defect engineering for enhanced magnetism and optoelectronic properties in atomically thin GeS
title_sort atomic scale intercalation and defect engineering for enhanced magnetism and optoelectronic properties in atomically thin ges
url https://doi.org/10.1038/s41598-025-88290-z
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AT sriharimkastuar atomicscaleintercalationanddefectengineeringforenhancedmagnetismandoptoelectronicpropertiesinatomicallythinges
AT gourjana atomicscaleintercalationanddefectengineeringforenhancedmagnetismandoptoelectronicpropertiesinatomicallythinges
AT chinedueekuma atomicscaleintercalationanddefectengineeringforenhancedmagnetismandoptoelectronicpropertiesinatomicallythinges